Structural and Oxidation Behavior of Nanocomposite TiCrN Thin Films

The structural and oxidation behavior of nanocomposite titanium chromium nitride (TiCrN) thin films has been investigated by using x-ray diffraction (XRD), energy dispersive spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM). TiCrN were deposited on Si substrates the reactive DC magnetron sputtering technique from Ti-Cr mosaic target. After that, as-deposited annealed in air at 500 - 900°C for 2 h. XRD results showed that formation anataseTiO2, rutile-TiO2, Cr2O3 which peak appear 500°C. relative intensity these oxide peaks varied with temperatures. By observing FE-SEM, aggregation grain increased annealing temperature. cross-sectional dense overlayer occurred 700°C thickness gradually Meanwhile, underneath grew above become more void structure after 700°C. dramatically increase oxygen content was found evolution Ti, Cr, N, O different elements compositions various temperatures EDS technique. layer obviously grows inward indicating belongs to oxidation. rate activation as evaluated Arrhenius-type relation 168 kJ/mol.